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Investigation on Metal–Oxide Graphene Field-Effect Transistors With Clamped Geometries

Authors :
Muraleetharan Boopathi
Jong Hyun Ahn
P. Cusumano
E.F. Calandra
F. Wu
Maximillian Thurmer
Christian Benz
Salvatore Stivala
Himadri Pandey
C. Arnone
Geethu Balachandran
Min-Ho Jang
Romain Danneau
Alessandro Busacca
Antonio Benfante
Wolfram H. P. Pernice
Marco A. Giambra
Riccardo Pernice
Giambra, Marco A.
Benz, Christian
Wu, Fan
Thurmer, Maximillian
Balachandran, Geethu
Benfante, Antonio
Pernice, Riccardo
Pandey, Himadri
Boopathi, Muraleetharan
Jang, Min-Ho
Ahn, Jong-Hyun
Stivala, Salvatore
Calandra, Enrico
Arnone, Claudio
Cusumano, Pasquale
Busacca, Alessandro
Pernice, Wolfram H. P.
Danneau, Romain
Source :
IEEE Journal of the Electron Devices Society. 7:964-968
Publication Year :
2019
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 2019.

Abstract

In this work, we report on the design, fabrication and characterization of Metal-Oxide Graphene Field-effect Transistors (MOGFETs) exploiting novel clamped gate geometries aimed at enhancing the device transconductance. The fabricated devices employ clamped metal contacts also for source and drain, as well as an optimized graphene meandered pattern for source contacting, in order to reduce parasitic resistance. Our experimental results demonstrate that MOGFETs with the proposed structure show improved high frequency performance, in terms of maximum available gain and transition frequency values, as a consequence of the higher equivalent transconductance obtained.

Details

ISSN :
21686734
Volume :
7
Database :
OpenAIRE
Journal :
IEEE Journal of the Electron Devices Society
Accession number :
edsair.doi.dedup.....6c52da47f260f8e35619f382bcd71d96