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Total Ionizing Dose Effects in 3-D NAND Flash Memories
- Source :
- IEEE Transactions on Nuclear Science. 66:48-53
- Publication Year :
- 2019
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2019.
-
Abstract
- The effects of total ionizing dose on 3-D flash memories irradiated with gamma rays are investigated. The evolution and shape of threshold voltage distributions are studied versus dose for floating gate cell NAND arrays with vertical-channel architecture. The dependence of total dose effects on the logic level stored in the cells, the underlying mechanisms, and the raw bit errors induced by gamma-rays are discussed. The results are then compared with planar NAND and NOR flash technologies, in terms of threshold voltage shifts and bit error rates, showing improvements over previous generations due to the new cell structure.
- Subjects :
- Physics
Nuclear and High Energy Physics
floating gate (FG) devices
business.industry
Gamma ray
total dose effects
NAND gate
Logic level
Threshold voltage
total ionizing dose (TID)
Non-volatile memory
Flash (photography)
Nuclear Energy and Engineering
Absorbed dose
flash memories
Bit error rate
Optoelectronics
3-D NAND
Electrical and Electronic Engineering
Hardware_ARITHMETICANDLOGICSTRUCTURES
business
Subjects
Details
- ISSN :
- 15581578 and 00189499
- Volume :
- 66
- Database :
- OpenAIRE
- Journal :
- IEEE Transactions on Nuclear Science
- Accession number :
- edsair.doi.dedup.....6a6bace015b4c1e6aa018a28ceb52eaf
- Full Text :
- https://doi.org/10.1109/tns.2018.2878911