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Effect of the annealing on the electrical and optical properties of electron beam evaporated ZnO thin films
- Source :
- Thin Solid Films, Thin Solid Films, Elsevier, 2005, 473 (1), pp.49-53. ⟨10.1016/j.tsf.2004.06.156⟩
- Publication Year :
- 2005
- Publisher :
- HAL CCSD, 2005.
-
Abstract
- International audience; Zinc oxide thin films have been grown on (100)-oriented silicon substrate at a temperature of 100 °C by reactive e-beam evaporation. Structural, electrical and optical characteristics have been compared before and after annealing in air by measurements of X-ray diffraction, real and imaginary parts of the dielectric coefficient, refractive index and electrical resistivity. X-ray diffraction measurements have shown that ZnO films are highly c-axis-oriented with a full width at half maximum (FWMH) lower than 0.5°. The electrical resistivity increases from 10-2 Ω cm to reach a value about 109 H cm after annealing at 750 °C. The FWHM decreases after annealing treatment, which proves the crystal quality improvement. Ellipsometer measurements show the improvement of the refractive index and the real dielectric coefficient after annealing treatment at 750 °C of the ZnO films evaporated by electron beam. Atomic force microscopy shows that the surfaces of the electron beam evaporated ZnO are relatively smooth. Finally, a comparative study on structural and optical properties of the electron beam evaporated ZnO and the rf magnetron deposited one is discussed.
- Subjects :
- Materials science
Annealing (metallurgy)
Electrical properties and measurements
02 engineering and technology
Dielectric
01 natural sciences
Electron beam physical vapor deposition
Optics
Ellipsometry
Electrical resistivity and conductivity
0103 physical sciences
Zinc oxide
Materials Chemistry
Thin film
010302 applied physics
Structural properties
Optical properties
business.industry
Metals and Alloys
Surfaces and Interfaces
021001 nanoscience & nanotechnology
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
[SPI.TRON]Engineering Sciences [physics]/Electronics
Full width at half maximum
Optoelectronics
0210 nano-technology
business
Refractive index
Subjects
Details
- Language :
- English
- ISSN :
- 00406090
- Database :
- OpenAIRE
- Journal :
- Thin Solid Films, Thin Solid Films, Elsevier, 2005, 473 (1), pp.49-53. ⟨10.1016/j.tsf.2004.06.156⟩
- Accession number :
- edsair.doi.dedup.....64ba33ea583ce6d104c7782cd6dc35e1