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Metallized ceramic substrate with mesa structure for voltage ramp-up of power modules

Authors :
Pierre Bidan
Lionel Laudebat
Helene Hourdequin
Marie-Laure Locatelli
Zarel Valdez-Nava
LAboratoire PLasma et Conversion d'Energie (LAPLACE)
Université Toulouse III - Paul Sabatier (UT3)
Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP)
Université Fédérale Toulouse Midi-Pyrénées
Matériaux Diélectriques dans la Conversion d’Energie (LAPLACE-MDCE)
Université Fédérale Toulouse Midi-Pyrénées-Université Toulouse III - Paul Sabatier (UT3)
Institut national universitaire Champollion [Albi] (INUC)
Source :
European Physical Journal: Applied Physics, European Physical Journal: Applied Physics, EDP Sciences, 2019, 87 (2), pp.20903. ⟨10.1051/epjap/2019180288⟩
Publication Year :
2019
Publisher :
EDP Sciences, 2019.

Abstract

International audience; As the available wide bandgap semiconductors continuingly increase their operating voltages, the electrical insulation used in their packaging is increasingly constrained. More precisely the ceramic substrate, used in demanding applications, represents a key multi-functional element is being in charge of the mechanical support of the metallic track that interconnects the semiconductor chips with the rest of the power system, as well as of electrical insulation and of thermal conduction. In this complex assembly, the electric field enhancement at the triple junction between the ceramic, the metallic track borders and the insulating environment is usually a critical point. When the electrical field at the triple point exceeds the critical value allowed by the insulation system, this hampers the device performance and limits the voltage rating for future systems. The solution proposed here is based on the shape modification of the ceramic substrate by creating a mesa structure (plateau) that holds the metallic tracks in the assembly. A numerical simulation approach is used to optimize the structure. After the elaboration of the structures by ultrasonic machining we observed a significant increase (30%) in the partial discharge detection voltages, at 10 pC sensitivity, in a substrate with a mesa structure when comparing to a conventional metallized ceramic substrate.

Details

ISSN :
12860050 and 12860042
Volume :
87
Database :
OpenAIRE
Journal :
The European Physical Journal Applied Physics
Accession number :
edsair.doi.dedup.....6496649dd5ff261b90655e594692db54
Full Text :
https://doi.org/10.1051/epjap/2019180288