Back to Search Start Over

Sensitization of silicon by singlet exciton fission in tetracene

Authors :
Collin F. Perkinson
Moungi G. Bawendi
Hannah L. Smith
Antoine Kahn
Julia F. Kompalla
Sarah Wieghold
Markus Einzinger
Marc A. Baldo
Lea Nienhaus
Daniel N. Congreve
Tony C. Wu
Source :
Physical Chemistry of Semiconductor Materials and Interfaces IX.
Publication Year :
2020
Publisher :
SPIE, 2020.

Abstract

Silicon dominates contemporary solar cell technologies1. But when absorbing photons, silicon (like other semiconductors) wastes energy in excess of its bandgap2. Reducing these thermalization losses and enabling better sensitivity to light is possible by sensitizing the silicon solar cell using singlet exciton fission, in which two excited states with triplet spin character (triplet excitons) are generated from a photoexcited state of higher energy with singlet spin character (a singlet exciton)3–5. Singlet exciton fission in the molecular semiconductor tetracene is known to generate triplet excitons that are energetically matched to the silicon bandgap6–8. When the triplet excitons are transferred to silicon they create additional electron–hole pairs, promising to increase cell efficiencies from the single-junction limit of 29 per cent to as high as 35 per cent9. Here we reduce the thickness of the protective hafnium oxynitride layer at the surface of a silicon solar cell to just eight angstroms, using electric-field-effect passivation to enable the efficient energy transfer of the triplet excitons formed in the tetracene. The maximum combined yield of the fission in tetracene and the energy transfer to silicon is around 133 per cent, establishing the potential of singlet exciton fission to increase the efficiencies of silicon solar cells and reduce the cost of the energy that they generate. A silicon and tetracene solar cell employing singlet fission uses an eight-angstrom-thick hafnium oxynitride interlayer to promote efficient triplet transfer, increasing the efficiency of the cell.

Details

Database :
OpenAIRE
Journal :
Physical Chemistry of Semiconductor Materials and Interfaces IX
Accession number :
edsair.doi.dedup.....59c1bf53c722e718c57d5c25b51a379f
Full Text :
https://doi.org/10.1117/12.2567365