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Electron beam lithography for contacting single nanowires on non-flat suspended substrates
- Source :
- Recercat. Dipósit de la Recerca de Catalunya, instname, Dipòsit Digital de la UB, Universidad de Barcelona
- Publication Year :
- 2019
- Publisher :
- Elsevier BV, 2019.
-
Abstract
- A methodology based on the use of Electron Beam Lithography for contacting individual nanowires on top of non-flat micromembranes and microhotplates has been implemented, and the practical details have been exhaustively described. The different fabrication steps have been adapted to the substrate’s topology, requiring specific holders and conditions. The methodology is demonstrated on individual SnO2 nanowires, which, after fabrication, have been characterized as functional resistive gas nanosensors towards NH3 and benchmarked against similar devices fabricated using more conventional Dual Beam Focused Ion Beam techniques, demonstrating the superior properties of the here presented methodology, which can be further extended to other non-conventional suspended substrates and nanomaterials.
- Subjects :
- Materials science
Fabrication
Nanowire
02 engineering and technology
Substrate (electronics)
010402 general chemistry
01 natural sciences
Focused ion beam
Nanomaterials
Nanosensor
Materials Chemistry
Electrical and Electronic Engineering
Instrumentation
Resistive touchscreen
Feixos electrònics
Nanoestructures
business.industry
Metals and Alloys
Electron beams
Gas detectors
Detectors de gasos
021001 nanoscience & nanotechnology
Condensed Matter Physics
Nanostructures
0104 chemical sciences
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Optoelectronics
0210 nano-technology
business
Electron-beam lithography
Subjects
Details
- ISSN :
- 09254005
- Volume :
- 286
- Database :
- OpenAIRE
- Journal :
- Sensors and Actuators B: Chemical
- Accession number :
- edsair.doi.dedup.....59250d8d792495c445f2b0f705432452