Application of static masking technique in magnetron sputtering technology for the production of linearly variable filters

Authors :: Harro Hagedorn
Julien Lumeau
Detlef Arhilger
Antonin Moreau
F. Lemarquis
Holger Reus
Fabien Lemarchand
Thomas Begou
RCMO (RCMO)
Institut FRESNEL (FRESNEL)
Centre National de la Recherche Scientifique (CNRS)-École Centrale de Marseille (ECM)-Aix Marseille Université (AMU)-Centre National de la Recherche Scientifique (CNRS)-École Centrale de Marseille (ECM)-Aix Marseille Université (AMU)
Buhler AG
Aix Marseille Université (AMU)-École Centrale de Marseille (ECM)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU)-École Centrale de Marseille (ECM)-Centre National de la Recherche Scientifique (CNRS)
Source :: CEAS Space Journal, CEAS Space Journal, Springer, In press, CEAS Space Journal, 2021, ⟨10.1007/s12567-021-00402-3⟩
Publication Year :: 2021
Publisher :: Springer Science and Business Media LLC, 2021.
Abstract: International audience; Variable filters are key components for compact spectral imagers. In this paper, we present a method for the fabrication of linearly variable filters based on Bühler HELIOS machine (plasma assisted reactive magnetron sputtering). These filters are obtained by producing a variation of the thickness of all the layers of the coating, using adapted masks placed in between the sputtering targets for the low and high refractive index materials and the substrates. Variable band pass filter from 550 nm up to 1000 nm is demonstrated.

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