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Application of Excimer-Laser Annealing to Amorphous, Poly-Crystal and Single-Crystal Silicon Thin-Film Transistors

Authors :
Masakiyo Matsumura
Source :
physica status solidi (a). 166:715-728
Publication Year :
1998
Publisher :
Wiley, 1998.

Subjects

Subjects :
Crystal
Materials science
Thin-film transistor
business.industry
Hybrid silicon laser
Nanocrystalline silicon
Optoelectronics
Single crystal silicon
Condensed Matter Physics
business
Excimer laser annealing
Electronic, Optical and Magnetic Materials
Amorphous solid

Details

ISSN :
1521396X and 00318965
Volume :
166
Database :
OpenAIRE
Journal :
physica status solidi (a)
Accession number :
edsair.doi.dedup.....54f1b0e90064f8fca056f20b4cfcbe5b

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