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Mechanisms of strain relaxation in III-V semiconductor heterostructures
- Publication Year :
- 1993
- Publisher :
- Elsevier BV:PO Box 211, 1000 AE Amsterdam Netherlands:011 31 20 4853757, 011 31 20 4853642, 011 31 20 4853641, EMAIL: nlinfo-f@elsevier.nl, INTERNET: http://www.elsevier.nl, Fax: 011 31 20 4853598, 1993.
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Abstract
- The known models describing the breakdown of coherency between layer and substrate in mismatched heterostructures are based on the isotropic elastic continuum approximation. As a matter of fact an internal contribution to the misfit accommodation, that is a deviation from the so-called “virtual crystal approximation”, is expected in ternary or more complex alloy structures. This effect is clearly seen in a set of In x Ga 1− x As / GaAs low misfit samples in the presence of misfit dislocations. The complete structural characterisation including the elastic distortion field and the dislocation density and distribution has been performed by means of Rutherford backscattering based techniques and double crystal X-ray diffraction.
- Subjects :
- Diffraction
Condensed matter physics
Chemistry
business.industry
semiconductor heterostructures
Isotropy
strain relaxation
Substrate (electronics)
Condensed Matter Physics
Inorganic Chemistry
Crystal
Condensed Matter::Materials Science
Optics
Materials Chemistry
Relaxation (physics)
Deformation (engineering)
Dislocation
business
Ternary operation
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Accession number :
- edsair.doi.dedup.....53b26e07bbfab66e5598f9e71612bd85