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SU-8 nanocomposite photoresist with low stress properties for microfabrication applications
- Source :
- Microelectronic Engineering. 83:1966-1970
- Publication Year :
- 2006
- Publisher :
- Elsevier BV, 2006.
-
Abstract
- A new nanocomposite photoresist based on SU-8 epoxy resin has been developed. It consists in a homogeneous dispersion of nano-silica particles in the negative tone photosensitive SU-8. The nanocomposite photoresist is more sensitive than the SU-8 photoresist and the photopatterned composite structures show low stress and less cracks than pure SU-8 structures. No significant resolution difference has been observed for both materials.
- Subjects :
- Nanocomposite
Materials science
Composite number
Epoxy
Photoresist
Condensed Matter Physics
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
law.invention
law
visual_art
visual_art.visual_art_medium
Electrical and Electronic Engineering
Composite material
Photolithography
SU-8 photoresist
Dispersion (chemistry)
Microfabrication
Subjects
Details
- ISSN :
- 01679317
- Volume :
- 83
- Database :
- OpenAIRE
- Journal :
- Microelectronic Engineering
- Accession number :
- edsair.doi.dedup.....51fed0ed67de898690b9504f93a8d9f5