Electronic Transport in Co-deposited Hydrogenated Amorphous/Nanocrystalline Thin Films

Mixed-phase hydrogenated amorphous silicon thin films containing nanocrystalline silicon inclusions have been synthesized in a dual chamber co-deposition system. A PECVD deposition system produces small crystalline silicon particles (3-5 nm diameter) in a flow-through reactor, and injects these particles into a separate capacitively-coupled plasma chamber in which hydrogenated amorphous silicon is deposited. Raman spectroscopy is used to determine the volume fraction of nanocrystals in the mixed phase thin films, while infra-red spectroscopy characterizes the hydrogen bonding structure as a function of nanocrystalline concentration. At a moderate concentration of 5 nm silicon crystallites, the dark conductivity and photoconductivity are consistently found to be higher than in mixed phase films with either lower or higher densities of nanocrystalline inclusions.