Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

MLA

Hwan-Jin Jeon, et al. “Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 Nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography.” Advanced Materials, vol. 32, Apr. 2020, p. 1907101. EBSCOhost, https://doi.org/10.1002/adma.201907101.

APA

Hwan-Jin Jeon, Sungwoo Jang, Soo-Yeon Cho, Hannes Jung, & Woo-Bin Jung. (2020). Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography. Advanced Materials, 32, 1907101. https://doi.org/10.1002/adma.201907101

Chicago

Hwan-Jin Jeon, Sungwoo Jang, Soo-Yeon Cho, Hannes Jung, and Woo-Bin Jung. 2020. “Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 Nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography.” Advanced Materials 32 (April): 1907101. doi:10.1002/adma.201907101.