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Nanofocusing of X-ray free-electron laser using wavefront-corrected multilayer focusing mirrors
- Source :
- Scientific Reports, Scientific Reports, Vol 8, Iss 1, Pp 1-10 (2018)
- Publication Year :
- 2018
- Publisher :
- Springer Science and Business Media LLC, 2018.
-
Abstract
- A method of fabricating multilayer focusing mirrors that can focus X-rays down to 10 nm or less was established in this study. The wavefront aberration induced by multilayer Kirkpatrick–Baez mirror optics was measured using a single grating interferometer at a photon energy of 9.1 keV at SPring-8 Angstrom Compact Free Electron Laser (SACLA), and the mirror shape was then directly corrected by employing a differential deposition method. The accuracies of these processes were carefully investigated, considering the accuracy required for diffraction-limited focusing. The wavefront produced by the corrected multilayer focusing mirrors was characterized again in the same manner, revealing that the root mean square of the wavefront aberration was improved from 2.7 (3.3) rad to 0.52 (0.82) rad in the vertical (horizontal) direction. A wave-optical simulator indicated that these wavefront-corrected multilayer focusing mirrors are capable of achieving sub-10-nm X-ray focusing.
- Subjects :
- Wavefront
Multidisciplinary
Materials science
business.industry
lcsh:R
Free-electron laser
X-ray
lcsh:Medicine
02 engineering and technology
Photon energy
021001 nanoscience & nanotechnology
01 natural sciences
Article
010309 optics
Root mean square
SACLA
Optics
0103 physical sciences
lcsh:Q
Angstrom
lcsh:Science
0210 nano-technology
Focus (optics)
business
Subjects
Details
- ISSN :
- 20452322
- Volume :
- 8
- Database :
- OpenAIRE
- Journal :
- Scientific Reports
- Accession number :
- edsair.doi.dedup.....4a3a355599db0d7396b96edea24cd86c