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Thermal conductivity of strained silicon: molecular dynamics insight and kinetic theory approach

Authors :
Vasyl Kuryliuk
Mykola Isaiev
Oleksii Nepochatyi
Patrice Chantrenne
David Lacroix
Taras Shevchenko National University of Kyiv
Centre de Thermique de Lyon (CETHIL)
Université Claude Bernard Lyon 1 (UCBL)
Université de Lyon-Université de Lyon-Institut National des Sciences Appliquées de Lyon (INSA Lyon)
Institut National des Sciences Appliquées (INSA)-Université de Lyon-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS)
Laboratoire Énergies et Mécanique Théorique et Appliquée (LEMTA )
Université de Lorraine (UL)-Centre National de la Recherche Scientifique (CNRS)
IMPACT N4S
ANR-15-IDEX-0004,LUE,Isite LUE(2015)
Source :
Journal of Applied Physics, Journal of Applied Physics, American Institute of Physics, 2019, 126 (5), pp.055109. ⟨10.1063/1.5108780⟩
Publication Year :
2019
Publisher :
arXiv, 2019.

Abstract

In this work, we investigated the tensile and compression forces effect on the thermal conductivity of silicon. We used the equilibrium molecular dynamics approach for the evaluation of thermal conductivity considering different interatomic potentials. More specifically, we tested Stillinger-Weber, Tersoff, Environment-Dependent Interatomic Potential, and Modified Embedded Atom Method potentials for the description of silicon atom motion under different strain and temperature conditions. It was shown that the Tersoff potential gives a correct trend of the thermal conductivity with the hydrostatic strain, while other potentials fail, especially when the compression strain is applied. Additionally, we extracted phonon density of states and dispersion curves from molecular dynamics simulations. These data were used for direct calculations of the thermal conductivity considering the kinetic theory approach. Comparison of molecular dynamics and kinetic theory simulations results as a function of strain and temperature allowed us to investigate the different factors affecting the thermal conductivity of the strained silicon.

Details

ISSN :
00218979 and 10897550
Database :
OpenAIRE
Journal :
Journal of Applied Physics, Journal of Applied Physics, American Institute of Physics, 2019, 126 (5), pp.055109. ⟨10.1063/1.5108780⟩
Accession number :
edsair.doi.dedup.....472766fe2bc9cf62264a7d914784b44e
Full Text :
https://doi.org/10.48550/arxiv.1904.10204