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Monte Carlo simulation of pulsed laser ablation into an ambient gas
- Source :
- Computational Materials Science, Computational Materials Science, Elsevier, 1998, 498 (1-4), pp.144-147. ⟨10.1016/S0927-0256(97)00127-4⟩, Computational Materials Science, 1998, 498 (1-4), pp.144-147. ⟨10.1016/S0927-0256(97)00127-4⟩
- Publication Year :
- 1998
- Publisher :
- Elsevier BV, 1998.
-
Abstract
- International audience; Laser ablation from one- and two-component targets into a diluted gas background is simulated by combined direct simulation-test particle Monte Carlo method. The spatial and velocity distributions of particles deposited at the plane substrate are calculated. The approach developed has allowed us to consider the influence of the collisions both among the ablated particles and between the ablated and ambient gas particles on the uniformity of film stoichiometry. It is found that the increase of the background gas pressure results in the more uniform distribution of the stoichiometrical ratio of the deposited particles with different masses.
- Subjects :
- Uniform distribution (continuous)
General Computer Science
Monte Carlo method
General Physics and Astronomy
02 engineering and technology
Substrate (electronics)
01 natural sciences
Molecular physics
Pulsed laser ablation
Optics
0103 physical sciences
[SPI.GPROC]Engineering Sciences [physics]/Chemical and Process Engineering
General Materials Science
010306 general physics
Laser ablation
Plane (geometry)
business.industry
Chemistry
General Chemistry
021001 nanoscience & nanotechnology
Computational Mathematics
Mechanics of Materials
Particle
0210 nano-technology
business
Stoichiometry
Subjects
Details
- ISSN :
- 09270256
- Volume :
- 10
- Database :
- OpenAIRE
- Journal :
- Computational Materials Science
- Accession number :
- edsair.doi.dedup.....44636c3f16fb8c62bf673bdd63f092e3
- Full Text :
- https://doi.org/10.1016/s0927-0256(97)00127-4