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Determination of the refractive index of a-Si_1−xCx:H thin films from infrared absorption spectra
- Source :
- Applied Optics. 32:1173
- Publication Year :
- 1993
- Publisher :
- The Optical Society, 1993.
-
Abstract
- The index of refraction of a-Si(1-x)C(x):H thin films obtained by dc magnetron sputtering was determined by means of IR absorption measurements. Structural and compositional changes that take place by increasing x make the film a mixture of different species, giving an effective value of the refractive index.
- Subjects :
- Amorphous silicon
Materials science
Infrared
business.industry
Materials Science (miscellaneous)
Infrared spectroscopy
Sputter deposition
Industrial and Manufacturing Engineering
Spectral line
chemistry.chemical_compound
Optics
chemistry
Business and International Management
Thin film
Absorption (electromagnetic radiation)
business
amorphous silicon carbide
effective index of refraction
optical properties
IR absorption measurements
Refractive index
Subjects
Details
- ISSN :
- 15394522 and 00036935
- Volume :
- 32
- Database :
- OpenAIRE
- Journal :
- Applied Optics
- Accession number :
- edsair.doi.dedup.....429420222b934db3daa59175142c6154
- Full Text :
- https://doi.org/10.1364/ao.32.001173