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Tunnel electroresistance through organic ferroelectrics

Authors :
Bobo Tian
J. L. Wang
A. Barthélémy
Vincent Garcia
J.H. Chu
Stéphane Fusil
Manuel Bibes
Yang Liu
Brahim Dkhil
Shuo Sun
Tie Lin
J.L. Sun
Xuelin Zhao
Chun-Gang Duan
Hongyan Shen
X. J. Meng
National laboratory for infrared physics
Shanghai institute of technical Pysics
University of Chinese Academy of Sciences [Beijing] (UCAS)
Laboratoire Structures, Propriétés et Modélisation des solides (SPMS)
Institut de Chimie du CNRS (INC)-CentraleSupélec-Centre National de la Recherche Scientifique (CNRS)
Unité mixte de physique CNRS/Thales (UMPhy CNRS/THALES)
Centre National de la Recherche Scientifique (CNRS)-THALES
Key Laboratory of Polar Materials and Devices
East China Normal University [Shangaï] (ECNU)
Source :
Nature Communications, Vol 7, Iss 1, Pp 1-6 (2016), Nature Communications, Nature Communications, Nature Publishing Group, 2016, ⟨10.1038/ncomms11502⟩
Publication Year :
2016
Publisher :
Nature Portfolio, 2016.

Abstract

Organic electronics is emerging for large-area applications such as photovoltaic cells, rollable displays or electronic paper. Its future development and integration will require a simple, low-power organic memory, that can be written, erased and readout electrically. Here we demonstrate a non-volatile memory in which the ferroelectric polarisation state of an organic tunnel barrier encodes the stored information and sets the readout tunnel current. We use high-sensitivity piezoresponse force microscopy to show that films as thin as one or two layers of ferroelectric poly(vinylidene fluoride) remain switchable with low voltages. Submicron junctions based on these films display tunnel electroresistance reaching 1,000% at room temperature that is driven by ferroelectric switching and explained by electrostatic effects in a direct tunnelling regime. Our findings provide a path to develop low-cost, large-scale arrays of organic ferroelectric tunnel junctions on silicon or flexible substrates.<br />Ferroelectric organic materials can be used for tunnel barriers in memory devices as a cheaper and eco-friendly replacement of their inorganic counterparts. Here, Tian et al. use poly(vinylidene fluoride) with 1–2 layer thickness to achieve giant tunnel electroresistance of 1,000% at room temperature.

Details

Language :
English
ISSN :
20411723
Volume :
7
Issue :
1
Database :
OpenAIRE
Journal :
Nature Communications
Accession number :
edsair.doi.dedup.....3ea3c967f157c698f745fe0ee1cbb1d1