XPS investigation of thin SiOx and SiOxNy overlayers

Authors :: Sefik Suzer
Ş. Sayan
Özgür Birer
A. Aydınlı
Süzer, Şefik
Aydınlı, Atilla
Source :: Journal of Molecular Structure
Publication Year :: 1999
Publisher :: Elsevier BV, 1999.
Abstract: Angle-resolved XPS is used to determine the thickness and the uniformity of the chemical composition with respect to oxygen and nitrogen of the very thin silicon oxide and oxynitride overlayers grown on silicon. (C) 1999 Elsevier Science B.V. All rights reserved.

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