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Polytypism in ultrathin tellurium

Authors :
Apte, A
Bianco, E
Krishnamoorthy, A
Yazdi, S
Rao, R
Glavin, N
Kumazoe, H
Varshney, V
Roy, A
Shimojo, F
Ringe, E
Kalia, RK
Nakano, A
Tiwary, CS
Vashishta, P
Kochat, V
Ajayan, PM
Apte, A [0000-0001-6337-5406]
Bianco, E [0000-0003-3211-9375]
Krishnamoorthy, A [0000-0001-6778-2471]
Glavin, N [0000-0002-9447-7509]
Varshney, V [0000-0002-2613-458X]
Ringe, E [0000-0003-3743-9204]
Nakano, A [0000-0003-3228-3896]
Tiwary, CS [0000-0001-9760-9768]
Apollo - University of Cambridge Repository
Publication Year :
2019
Publisher :
IOP Publishing, 2019.

Abstract

We report the synthesis of ultrathin tellurium films, including atomically thin tellurium tri-layers, by physical vapor deposition (PVD) as well as larger area films by pulsed laser deposition (PLD). PVD leads to sub-nanometer, tri-layer tellurene flakes with distinct boundaries, whereas PLD yields uniform and contiguous sub-7 nm films over a centimeter square. The PLD films exhibit the characteristic hexagonal crystal structure of semiconducting tellurium, but high resolution transmission electron microscopy (HRTEM) reveals a unique stacking polytype in the thinner PVD-grown material. Density Functional Theory calculations predict the possible existence of three polytypes of ultrathin Te, including the α-type experimentally observed here. The two complementary growth methods afford a route to controllably synthesize ultrathin Te with thicknesses ranging from three atomic layers up to 6 nm with unique polytypism. Lastly, temperature dependent Raman studies suggest the possible coexistence of polymorphs.

Details

Database :
OpenAIRE
Accession number :
edsair.doi.dedup.....3a0bf454d837a536ad381a716c5d4010