Back to Search
Start Over
Doping graphene transistors using vertical stacked monolayer WS2 heterostructures grown by chemical vapor deposition
- Source :
- ACS Applied Materials and Interfaces. 8(3)
- Publication Year :
- 2016
-
Abstract
- We study the interactions in graphene/WS2 two-dimensional (2D) layered vertical heterostructures with variations in the areal coverage of graphene by the WS2. All 2D materials were grown by chemical vapor deposition and transferred layer by layer. Photoluminescence (PL) spectroscopy of WS2 on graphene showed PL quenching along with an increase in the ratio of exciton/trion emission, relative to WS2 on SiO2 surface, indicating a reduction in the n-type doping levels of WS2 as well as reduced radiative recombination quantum yield. Electrical measurements of a total of 220 graphene field effect transistors with different WS2 coverage showed double-Dirac points in the field effect measurements, where one is shifted closer toward the 0 V gate neutrality position due to the WS2 coverage. Photoirradiation of the WS2 on graphene region caused further Dirac point shifts, indicative of a reduction in the p-type doping levels of graphene, revealing that the photogenerated excitons in WS2 are split across the heterostructure by electron transfer from WS2 to graphene. Kelvin probe microscopy showed that regions of graphene covered with WS2 had a smaller work function and supports the model of electron transfer from WS2 to graphene. Our results demonstrate the formation of junctions within a graphene transistor through the spatial tuning of the work function of graphene using these 2D vertical heterostructures.
- Subjects :
- Materials science
Condensed matter physics
Graphene
Field effect
Heterojunction
02 engineering and technology
010402 general chemistry
021001 nanoscience & nanotechnology
01 natural sciences
0104 chemical sciences
law.invention
law
Monolayer
General Materials Science
Work function
Trion
0210 nano-technology
Bilayer graphene
Graphene nanoribbons
Subjects
Details
- Language :
- English
- ISSN :
- 19448252 and 19448244
- Volume :
- 8
- Issue :
- 3
- Database :
- OpenAIRE
- Journal :
- ACS Applied Materials and Interfaces
- Accession number :
- edsair.doi.dedup.....36b476ed15203720c43ca24320f86f1f