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Investigation of Gate Direct-Current and Fluctuations in Organic p-Type Thin-Film Transistors

Authors :
Luigi Mariucci
Sabrina Calvi
Matteo Rapisarda
Guglielmo Fortunato
Gino Giusi
Graziella Scandurra
Carmine Ciofi
Source :
IEEE electron device letters, 37 (2016): 1625–1627. doi:10.1109/LED.2016.2618757, info:cnr-pdr/source/autori:Giusi, Gino; Scandurra, Graziella; Calvi, Sabrina; Fortunato, Guglielmo; Rapisarda, Matteo; Mariucci, Luigi; Ciofi, Carmine/titolo:Investigation of Gate Direct-Current and Fluctuations in Organic p-Type Thin-Film Transistors/doi:10.1109%2FLED.2016.2618757/rivista:IEEE electron device letters (Print)/anno:2016/pagina_da:1625/pagina_a:1627/intervallo_pagine:1625–1627/volume:37
Publication Year :
2016

Abstract

Investigation of gate dielectric conduction properties in organic p-type staggered thin-film transistors is reported by means of direct-current, capacitance–voltage, and noise measurements. Results suggest that transport in the CYTOP™ gate dielectric is dominated, at low currents, by Schottky conduction due to the emission at the aluminum gate interface through a barrier $\phi _{B} \approx 1$ eV, while is limited, at higher currents, by space-charge conduction in the trap-limited regime with an effective mobility $\mu \theta $ estimated in the order of $10^{-9}$ cm2/(Vs). Gate current noise follows a 1/ $f$ law and it is found to be proportional to $I_{G}^{2}$ , which is inconsistent with the commonly assumed mobility fluctuation. Traps responsible for gate noise are dielectric-bulk traps, not located at the semiconductor interface, since the gate noise is found to be uncorrelated with drain noise.

Details

Language :
English
Database :
OpenAIRE
Journal :
IEEE electron device letters, 37 (2016): 1625–1627. doi:10.1109/LED.2016.2618757, info:cnr-pdr/source/autori:Giusi, Gino; Scandurra, Graziella; Calvi, Sabrina; Fortunato, Guglielmo; Rapisarda, Matteo; Mariucci, Luigi; Ciofi, Carmine/titolo:Investigation of Gate Direct-Current and Fluctuations in Organic p-Type Thin-Film Transistors/doi:10.1109%2FLED.2016.2618757/rivista:IEEE electron device letters (Print)/anno:2016/pagina_da:1625/pagina_a:1627/intervallo_pagine:1625–1627/volume:37
Accession number :
edsair.doi.dedup.....366c815f0c8aad1220d84755e2c71676