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Comparison of the B field dependency of plasma parameters of a weakly magnetized inductive and Helicon hydrogen discharge
- Source :
- Plasma Sources Science and Technology
- Publication Year :
- 2016
-
Abstract
- The discharge properties of a weakly magnetized inductively coupled hydrogen discharge (operating pressure 1 Pa) are evaluated by using optical emission spectroscopy. The behaviour of the electron density n e, temperature T e and the density ratio of atomic to molecular hydrogen n H/ with varying magnetic field strength (up to 12 mT) is investigated. The results obtained from the OES measurements performed with a line of sight directed along the central axis of the cylindrical discharge vessel are compared to the case when the ICP antenna is replaced by a Nagoya-type-III Helicon antenna. In the ICP case, the electron temperature and density at the axis of the cylindrical discharge vessel decrease with increasing magnetic field due to the hindered radial electron diffusion. This results in a gradual transition from a homogeneous radial emission profile to a hollow profile with minimal emission in the discharge centre. Concerning the density ratio of atomic to molecular hydrogen, one obtains very high values of up to 0.32 at low B field and a decreasing behaviour with higher magnetic fields. For the Helicon case, the obtained values of n e and T e are virtually unaffected by the external magnetic field. Furthermore, a hollow radial emission profile is observed already at low B field strengths. In the Helicon setup one obtains an increasing trend for n H/ with a maximum of about 0.2 at 12 mT.
- Subjects :
- 010302 applied physics
Electron density
Hydrogen
Field (physics)
Plasma parameters
chemistry.chemical_element
Electron
Condensed Matter Physics
01 natural sciences
010305 fluids & plasmas
Magnetic field
Helicon
chemistry
Physics::Plasma Physics
0103 physical sciences
Electron temperature
Atomic physics
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- Plasma Sources Science and Technology
- Accession number :
- edsair.doi.dedup.....3458efb0fd18352da787605dd11f3204