Characterization of a new substrate for tunneling spectroscopy

An insulating layer is produced on aluminum by glow discharge in CF4. This substrate, used as the insulator of metal-insulator-metal diodes is characterized by Inelastic Electron Tunneling Spectroscopy as an aluminum trifluoride AlF3. The adsorption of ammonia, benzylamine. formic and propiolic acid on this substrate is investigated. A comparison between spectra of samples obtained on this insulator and on alumina for the same dopant molecules shows significant differences which are interpreted as revealing an enhanced Lewis acidity of AlF3 relative to Al2O3, determined — at least in part — by an enhanced electronegativity of surface Al+ cations of AlF3.