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Hybrid-RRAM toward Next Generation of Nonvolatile Memory: Coupling of Oxygen Vacancies and Metal Ions

Authors :
R. Gassilloud
Benoit Sklenard
Cecile Nail
Christophe Vallée
Gilbert Sassine
Aurélie Marty
Etienne Nowak
Mathieu Bernard
Gabriel Molas
Philippe Blaise
Marc Veillerot
Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI)
Direction de Recherche Technologique (CEA) (DRT (CEA))
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
Centre National de la Recherche Scientifique (CNRS)
Université Grenoble Alpes [2016-2019] (UGA [2016-2019])
Laboratoire des technologies de la microélectronique (LTM )
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])
European Project: 621217,EC:FP7:SP1-JTI,ENIAC-2013-2,PANACHE(2014)
European Project: 783176,WAKeMeUp
Source :
Advanced Electronic Materials, Advanced Electronic Materials, Wiley, 2019, 5 (2), pp.1800658. ⟨10.1002/aelm.201800658⟩, Advanced Electronic Materials, Wiley, 2018, pp.1800658, Advanced Electronic Materials, 2018, 5 (2), pp.1800658. ⟨10.1002/aelm.201800658⟩, Advanced Electronic Materials, Wiley, 2018, 5, pp.1800658. ⟨10.1002/aelm.201800658⟩
Publication Year :
2019

Abstract

International audience; In this paper, the impact of copper and oxygen vacancy balance in filament composition as a key factor for oxide-based CBRAM (Hybrid RRAM) performances is investigated. To this aim, several RRAM technologies are studied using various resistive layers and top electrodes. Material analyses allow to highlight the hybrid aspect of HRRAM conductive filament. Density functional theory simulations are used to extract microscopic features and highlight differences from a material point of view. Integrated RRAM technology performances such as window margin, endurance and retention are then measured to analyze copper and oxygen vacancy influence on device characteristics. A new RRAM classification correlating filament composition and memory performances is proposed.

Details

ISSN :
2199160X
Database :
OpenAIRE
Journal :
Advanced Electronic Materials
Accession number :
edsair.doi.dedup.....3128b17e40069f0f256a63e654f5f8f2
Full Text :
https://doi.org/10.1002/aelm.201800658