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Optimisation of 100V high side LDMOS using multiple simulation techniques
- Source :
- 2009 21st International Symposium on Power Semiconductor Devices & IC's.
- Publication Year :
- 2009
- Publisher :
- IEEE, 2009.
-
Abstract
- A combination of conventional cross sectional process and device simulations combined with top down and 3D device simulations have been used to design and optimise the integration of a 100V Lateral DMOS (LDMOS) device for high side bridge applications. This combined simulation approach can streamline the device design process and gain important information about end effects which are lost from 2D cross sectional simulations. Design solutions to negate detrimental end effects are proposed and optimised by top down and 3D simulations and subsequently proven on tested silicon.
Details
- ISSN :
- 1943653X
- Database :
- OpenAIRE
- Journal :
- 2009 21st International Symposium on Power Semiconductor Devices & IC's
- Accession number :
- edsair.doi.dedup.....2ee095af7fee0e18e63490b0dfaf747e
- Full Text :
- https://doi.org/10.1109/ispsd.2009.5158012