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Competitive Adsorption as a Route to Area-Selective Deposition

Authors :
Pengyuan Zhao
Jonathan Wong
Ka Un Lao
Yan Yang
Hsin-Yu Ko
Robert A. DiStasio
Taewon Suh
James R. Engstrom
Source :
ACS applied materialsinterfaces. 12(8)
Publication Year :
2020

Abstract

In this work, we have explored the use of a third species during chemical vapor deposition (CVD) to direct thin-film growth to occur exclusively on one surface in the presence of another. Using a combination of density functional theory (DFT) calculations and experiments, including in situ surface analysis, we have examined the use of 4-octyne as a coadsorbate in the CVD of ZrO

Details

ISSN :
19448252
Volume :
12
Issue :
8
Database :
OpenAIRE
Journal :
ACS applied materialsinterfaces
Accession number :
edsair.doi.dedup.....299ec4d4c4c844c8791993483c186819