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Stabilization of the cubic phase of HfO2 by Y addition in films grown by metal organic chemical vapor deposition
- Source :
- Applied physics letters 89, 012902 (2006). doi:10.1063/1.2216102, Applied physics letters, Applied Physics Letters, Applied Physics Letters, American Institute of Physics, 2006, 89, pp.012902, Applied Physics Letters, 2006, 89, pp.012902
- Publication Year :
- 2006
- Publisher :
- American Institute of Physics, 2006.
-
Abstract
- Addition of yttrium in HfO(2) thin films prepared on silicon by metal organic chemical vapor deposition is investigated in a wide compositional range (2.0-99.5 at. %). The cubic structure of HfO(2) is stabilized for 6.5 at. %. The permittivity is maximum for yttrium content of 6.5-10 at. %; in this range, the effective permittivity, which results from the contribution of both the cubic phase and silicate phase, is of 22. These films exhibit low leakage current density (5x10(-7) A/cm(2) at -1 V for a 6.4 nm film). The cubic phase is stable upon postdeposition high temperature annealing at 900 degrees C under NH(3). (c) 2006 American Institute of Physics.
- Subjects :
- Permittivity
Materials science
Physics and Astronomy (miscellaneous)
Silicon
Inorganic chemistry
Analytical chemistry
chemistry.chemical_element
02 engineering and technology
Chemical vapor deposition
01 natural sciences
high K
0103 physical sciences
ddc:530
Metalorganic vapour phase epitaxy
Thin film
ComputingMilieux_MISCELLANEOUS
010302 applied physics
Physics
Yttrium
Combustion chemical vapor deposition
021001 nanoscience & nanotechnology
permittivity
Carbon film
chemistry
MOCVD
[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]
oxide
stabilisation
0210 nano-technology
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Database :
- OpenAIRE
- Journal :
- Applied physics letters 89, 012902 (2006). doi:10.1063/1.2216102, Applied physics letters, Applied Physics Letters, Applied Physics Letters, American Institute of Physics, 2006, 89, pp.012902, Applied Physics Letters, 2006, 89, pp.012902
- Accession number :
- edsair.doi.dedup.....292be49e5600e8b2d298efd7ef9e43b7
- Full Text :
- https://doi.org/10.1063/1.2216102