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Tailoring the synaptic properties of a-IGZO memristors for artificial deep neural networks

Authors :
Pereira, Maria Elias
Deuermeier, Jonas
Freitas, Pedro
Barquinha, Pedro
Zhang, Weidong
Martins, Rodrigo
Fortunato, Elvira
Kiazadeh, Asal
DCM - Departamento de Ciência dos Materiais
CENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)
UNINOVA-Instituto de Desenvolvimento de Novas Tecnologias
Source :
APL Materials, APL Materials, Vol 10, Iss 1, Pp 011113-011113-10 (2022)
Publication Year :
2022

Abstract

UIDB/50025/2020-202 DFA/BD/8335/2020 No. PTDC/NAN-MAT/30812/2017 Grant Nos. EP/M006727/1 EP/S000259/1 Neuromorphic computation based on resistive switching devices represents a relevant hardware alternative for artificial deep neural networks. For the highest accuracies on pattern recognition tasks, an analog, linear, and symmetric synaptic weight is essential. Moreover, the resistive switching devices should be integrated with the supporting electronics, such as thin-film transistors (TFTs), to solve crosstalk issues on the crossbar arrays. Here, an a-Indium-gallium-zinc-oxide (IGZO) memristor is proposed, with Mo and Ti/Mo as bottom and top contacts, with forming-free analog switching ability for an upcoming integration on crossbar arrays with a-IGZO TFTs for neuromorphic hardware systems. The development of a TFT compatible fabrication process is accomplished, which results in an a-IGZO memristor with a high stability and low cycle-to-cycle variability. The synaptic behavior through potentiation and depression tests using an identical spiking scheme is presented, and the modulation of the plasticity characteristics by applying non-identical spiking schemes is also demonstrated. The pattern recognition accuracy, using MNIST handwritten digits dataset, reveals a maximum of 91.82% accuracy, which is a promising result for crossbar implementation. The results displayed here reveal the potential of Mo/a-IGZO/Ti/Mo memristors for neuromorphic hardware. publishersversion published

Details

Language :
English
ISSN :
2166532X
Database :
OpenAIRE
Journal :
APL Materials, APL Materials, Vol 10, Iss 1, Pp 011113-011113-10 (2022)
Accession number :
edsair.doi.dedup.....284a14d6b01bc841d1980c00997a1400