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Tunable Resistive Switching Enabled by Malleable Redox Reaction in the Nano-Vacuum Gap
- Source :
- ACS Applied Materials & Interfaces. 11:20965-20972
- Publication Year :
- 2019
- Publisher :
- American Chemical Society (ACS), 2019.
-
Abstract
- Neuromorphic computing has emerged as a highly promising alternative to conventional computing. The key to constructing a large-scale neural network in hardware for neuromorphic computing is to develop artificial neurons with leaky integrate-and-fire behavior and artificial synapses with synaptic plasticity using nanodevices. So far, these two basic computing elements have been built in separate devices using different materials and technologies, which poses a significant challenge to system design and manufacturing. In this work, we designed a resistive device embedded with an innovative nano-vacuum gap between a bottom electrode and a mixed-ionic-electronic-conductor (MIEC) layer. Through redox reaction on the MIEC surface, metallic filaments dynamically grew within the nano-vacuum gap. The nano-vacuum gap provided an additional control factor for controlling the evolution dynamics of metallic filaments by tuning the electron tunneling efficiency, in analogy to a pseudo-three-terminal device, resulting in tunable switching behavior in various forms from volatile to nonvolatile switching in a single device. Our device demonstrated cross-functions, in particular, tunable neuronal firing and synaptic plasticity on demand, providing seamless integration for building large-scale artificial neural networks for neuromorphic computing.
- Subjects :
- 010302 applied physics
Resistive touchscreen
Materials science
Artificial neural network
business.industry
02 engineering and technology
021001 nanoscience & nanotechnology
01 natural sciences
Neuromorphic engineering
0103 physical sciences
Nano
Electrode
Hardware_INTEGRATEDCIRCUITS
Artificial neuron
Systems design
Optoelectronics
General Materials Science
0210 nano-technology
business
Quantum tunnelling
Subjects
Details
- ISSN :
- 19448252 and 19448244
- Volume :
- 11
- Database :
- OpenAIRE
- Journal :
- ACS Applied Materials & Interfaces
- Accession number :
- edsair.doi.dedup.....2776957e5824d54a06f2deff4b2d7b45
- Full Text :
- https://doi.org/10.1021/acsami.9b02498