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Effects of HPEM stress on GaAs low-noise amplifier from circuit to component scale

Authors :
Tristan Dubois
Patrick Hoffmann
Geneviève Duchamp
M. Girard
GRAMAT (DAM/GRAMAT)
Direction des Applications Militaires (DAM)
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
Laboratoire de l'intégration, du matériau au système (IMS)
Université Sciences et Technologies - Bordeaux 1 (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS)
Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Université Sciences et Technologies - Bordeaux 1
Source :
Microelectronics Reliability, Microelectronics Reliability, 2018, 88-90, pp.914-919. ⟨10.1016/j.microrel.2018.07.108⟩, Microelectronics Reliability, Elsevier, 2018, 88-90, pp.914-919. ⟨10.1016/j.microrel.2018.07.108⟩
Publication Year :
2018
Publisher :
Elsevier BV, 2018.

Abstract

International audience; This paper presents a study of High Power Electromagnetics (HPEM) stress effects on a GaAs (Gallium Arsenide) low-noise amplifier (LNA). This work aims to evaluate such electrical stress effect from circuit to component scale in relation to more general Intentional electromagnetic interference (IEMI) studies. Conducted susceptibility measurements were made on a specifically designed device under test (DUT). Those experiments yielded interesting results concerning exposition of the DUT to destructive values of interference power, as well as its response to non-destructive but significant powers. The destruction process has been analyzed using time-domain and frequency-domain measurements.

Details

ISSN :
00262714
Database :
OpenAIRE
Journal :
Microelectronics Reliability
Accession number :
edsair.doi.dedup.....2069656e3471998dc40f0cdaa5fa29bf