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Addendum: Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy (2018 J PHYS D APPL PHYS 52 034004)

Authors :
Gerrit Jacobus Hendrik Brussaard
O.J. Luiten
Vadim Yevgenyevich Banine
Bart Platier
M. A. W. van Ninhuijs
F. M. J. H. van de Wetering
J Job Beckers
Elementary Processes in Gas Discharges
Coherence and Quantum Technology
Complex Ionized Media
Center for Quantum Materials and Technology Eindhoven
ICMS Core
Source :
Journal of Physics D: Applied Physics, 53(35):359401. Institute of Physics
Publication Year :
2020

Abstract

A new approach for an in-line beam monitor for ionizing radiation was introduced in a recent publication (Beckers, J., et al. "Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy." Journal of Physics D: Applied Physics 52.3 (2018): 034004.). Due to the recent detection and investigation of an additional third decay regime of the afterglow of an extreme ultraviolet photon-induced plasma described in a later article (Platier, B., et al. "Transition of ambipolar-to-free diffusion in the decay of an extreme ultraviolet photon-induced low-pressure argon plasma." Applied Physics Letters 116.10 (2020), 103703.) there is an additional reason for a minimum number of photons for this approach to work. Near or below this threshold, we explain that the response time of the diagnostic method is a limiting factor. Further, a second limit for the number of photons within a pulse is formalized related to the trapping of highly energetic free electrons.

Details

Language :
English
ISSN :
00223727
Volume :
53
Issue :
35
Database :
OpenAIRE
Journal :
Journal of Physics D: Applied Physics
Accession number :
edsair.doi.dedup.....1efe06b5c1a1f4210ae742d1a5600a98