Chromium films deposition by hot target high power pulsed magnetron sputtering: Deposition conditions and film properties

This study focuses on the deposition conditions, structural and mechanical properties of Cr films obtained by magnetron sputtering with hot target, and using high power pulsed supply with pre-ionization (pulse frequency 500 Hz, duty cycle 4% in the range of averaged power from 15 to 40 W/cm 2 ). It has been found that hot target leads to a tenfold increase in the energy flux to the substrate compared to magnetron sputtering with cooled target. Intense sublimation from the target allows increasing the deposition rate of Cr films of about an order of magnitude. Moreover, the increase in the magnetron power may be accompanied by less heating of the substrates when depositing films of the same thickness. High power pulsed magnetron sputtering (HPPMS) with sublimating Cr hot target can be characterized by a combined mode in the film structure formation, leading to the formation of pores at the initial stage of growth. Cr films with a thickness of about 10 μm, obtained using a hot target, have lower surface roughness, hardness, and Young's modulus compared with sputtered Cr from a cooled target.