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Excess low-frequency noise in AlGaN/GaN-based high-electron-mobility transistors
- Source :
- Applied physics letters 80, 2126 (2002). doi:10.1063/1.1463202
- Publication Year :
- 2002
- Publisher :
- American Institute of Physics, 2002.
-
Abstract
- The low-frequency 1/f noise characteristics of AlGaN/GaN high-electron-mobility transistors with gate length scaled down to 150 nm grown on sapphire by metalorganic chemical vapor deposition have been studied. Certain features of the 1/f noise have been revealed in these short-gate transistors. The low-frequency noise spectra show drastically different behavior depending on the gate voltage V-G in the range of low (V(Gt)less than or equal toV(G)less than or equal to0) and high (V-G
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- Applied physics letters 80, 2126 (2002). doi:10.1063/1.1463202
- Accession number :
- edsair.doi.dedup.....18af5fb6330842ef2d6bb5b8ac88313b