Back to Search Start Over

Excess low-frequency noise in AlGaN/GaN-based high-electron-mobility transistors

Authors :
S. V. Danylyuk
L.F. Eastman
V. Tilak
Alexander Belyaev
Nigel Klein
V. N. Sokolov
V. A. Kochelap
Mykhaylo Petrychuk
Svetlana Vitusevich
A. Vertiatchikh
Joseph A. Smart
Source :
Applied physics letters 80, 2126 (2002). doi:10.1063/1.1463202
Publication Year :
2002
Publisher :
American Institute of Physics, 2002.

Abstract

The low-frequency 1/f noise characteristics of AlGaN/GaN high-electron-mobility transistors with gate length scaled down to 150 nm grown on sapphire by metalorganic chemical vapor deposition have been studied. Certain features of the 1/f noise have been revealed in these short-gate transistors. The low-frequency noise spectra show drastically different behavior depending on the gate voltage V-G in the range of low (V(Gt)less than or equal toV(G)less than or equal to0) and high (V-G

Details

Language :
English
Database :
OpenAIRE
Journal :
Applied physics letters 80, 2126 (2002). doi:10.1063/1.1463202
Accession number :
edsair.doi.dedup.....18af5fb6330842ef2d6bb5b8ac88313b