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Modification of GaAs surface by low-current Townsend discharge
- Source :
- Journal of Physics D: Applied Physics, Journal of Physics D: Applied Physics, IOP Publishing, 2010, 43 (27), pp.275302. ⟨10.1088/0022-3727/43/27/275302⟩
- Publication Year :
- 2010
- Publisher :
- HAL CCSD, 2010.
-
Abstract
- The influence of stationary spatially homogeneous Townsend discharge on the (1 0 0) surface of semi-insulating GaAs samples is studied. Samples exposed to both electrons and ions in a nitrogen discharge at a current density j = 60 µ Ac m −2 are studied by means of x-ray photoelectron spectroscopy, ellipsometry and atomic force microscopy. It is shown that an exposure to low-energy ions (
- Subjects :
- Acoustics and Ultrasonics
Analytical chemistry
02 engineering and technology
Surface finish
68.47.Fg
01 natural sciences
Ion
52.80.Dy
X-ray photoelectron spectroscopy
Ellipsometry
52.77.Bn
0103 physical sciences
Surface roughness
010302 applied physics
business.industry
Chemistry
021001 nanoscience & nanotechnology
Condensed Matter Physics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Semiconductor
Townsend discharge
Atomic physics
0210 nano-technology
business
Current density
68.37.Ps
Subjects
Details
- Language :
- English
- ISSN :
- 00223727 and 13616463
- Database :
- OpenAIRE
- Journal :
- Journal of Physics D: Applied Physics, Journal of Physics D: Applied Physics, IOP Publishing, 2010, 43 (27), pp.275302. ⟨10.1088/0022-3727/43/27/275302⟩
- Accession number :
- edsair.doi.dedup.....174220fe95f59ddb1fa290e6a14684ad
- Full Text :
- https://doi.org/10.1088/0022-3727/43/27/275302⟩