Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas

Authors :: Tobias W. W. Maß
Georg Kunkemöller
Serhiy Danylyuk
Ann-Katrin U. Michel
Thomas Taubner
Sascha Brose
Larissa Juschkin
Hyun-su Kim
Publica
Source :: Optics express 23(20), 25487-(2015). doi:10.1364/OE.23.025487, Optics express 23(20), 25487-25495 (2015). doi:10.1364/OE.23.025487
Publication Year :: 2015
Publisher :: The Optical Society, 2015.
Abstract: Optics express 23(20), 25487-25495 (2015). doi:10.1364/OE.23.025487<br />Published by Optical Society of America, Washington, DC

Subjects :: Materials science
Fabrication
business.industry
Infrared
Extreme ultraviolet lithography
Astrophysics::Instrumentation and Methods for Astrophysics
Finite-difference time-domain method
Physics::Optics
Photoresist
Atomic and Molecular Physics, and Optics
Computer Science::Other
Wavelength
Optics
Extreme ultraviolet
Optoelectronics
ddc:530
business
Lithography

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