Comparison of two techniques for reliable characterization of thin metal–dielectric films

In the present study we determine the optical parameters of thin metal–dielectric films using two different characterization techniques based on nonparametric and multiple oscillator models. We consider four series of thin metal–dielectric films produced under various deposition conditions with different optical properties. We compare characterization results obtained by nonparametric and multiple oscillator techniques and demonstrate that the results are consistent. The consistency of the results proves their reliability.