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Selective surface functionalization at regions of high local curvature in graphene
- Source :
- Chemical communications (Cambridge, England). 49(7)
- Publication Year :
- 2012
-
Abstract
- Monolayer graphene was deposited on a Si wafer substrate decorated with SiO(2) nanoparticles (NPs) and then exposed to aryl radicals that were generated in situ from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.
- Subjects :
- Materials science
Nanoparticle
Nanotechnology
Photochemistry
Spectrum Analysis, Raman
Catalysis
law.invention
symbols.namesake
chemistry.chemical_compound
law
Materials Chemistry
Wafer
Graphene
Aryl
technology, industry, and agriculture
Metals and Alloys
Substrate (chemistry)
General Chemistry
Silicon Dioxide
Selective surface
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
chemistry
Ceramics and Composites
symbols
Surface modification
Nanoparticles
Graphite
Raman spectroscopy
Subjects
Details
- ISSN :
- 1364548X
- Volume :
- 49
- Issue :
- 7
- Database :
- OpenAIRE
- Journal :
- Chemical communications (Cambridge, England)
- Accession number :
- edsair.doi.dedup.....0f59688dad6caedc44d7be28d69e5150