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Selective surface functionalization at regions of high local curvature in graphene

Authors :
Qingzhi Wu
Huifeng Li
Jianxin Geng
Yujie Ren
Richard D. Piner
Danil W. Boukhvalov
Yaping Wu
Hengxing Ji
Shanshan Chen
Christopher W. Bielawski
Yufeng Hao
Matthew Charlton
Rodney S. Ruoff
Source :
Chemical communications (Cambridge, England). 49(7)
Publication Year :
2012

Abstract

Monolayer graphene was deposited on a Si wafer substrate decorated with SiO(2) nanoparticles (NPs) and then exposed to aryl radicals that were generated in situ from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.

Details

ISSN :
1364548X
Volume :
49
Issue :
7
Database :
OpenAIRE
Journal :
Chemical communications (Cambridge, England)
Accession number :
edsair.doi.dedup.....0f59688dad6caedc44d7be28d69e5150