Erratum: 'Ion-channeling analysis of boron clusters in silicon' [J. Appl. Phys. 90, 4741 (2001)]

Authors :: T. J. Eijkemans
M.J.A. de Voigt
M. J. J. Theunissen
L.J. van IJzendoorn
F.J.J. Janssen
P.J.M. Smulders
L. J. M. Selen
Source :: Journal of Applied Physics. 91(8)
Publication Year :: 2002
Publisher :: AMER INST PHYSICS, 2002.

Subjects :: Semiconductor thin films
Materials science
Condensed matter physics
Silicon
Monte Carlo method
General Physics and Astronomy
chemistry.chemical_element
Boron clusters
Deformation (meteorology)
Channelling
Crystallography
chemistry
Ion channeling
X-ray crystallography

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