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Geometric structure and electronic states of copper films on a ruthenium (0001) surface
- Source :
- Surface Science Letters. 134:A420
- Publication Year :
- 1983
- Publisher :
- Elsevier BV, 1983.
-
Abstract
- Auger electron spectroscopy (AES), combined with thermal desorption mass spectroscopy (TDS), work function (Δφ) measurements and energy-dependent angular resolved UV photoemission using synchrotron radiation were used to investigate the geometric and electronic properties of submonolayer and monolayer copper films grown by vapor deposition on a clean Ru(0001) substrate. A pronounced influence of the deposition temperature on the morphology of the Cu films was established in that lower temperatures favor an island growth mechanism (Stranski-Krastanov or Volmer-Weber type), whereas higher deposition temperatures lead to a more uniform spreading and a layer-by-layer growth (Frank-van der Merwe type). For Cu films grown under the latter conditions angular resolved photoemission reveals the existence of two-dimensional Cu bands even before the monolayer has reached completion; the experimentally determined band dispersions agree quite well with recent theoretical calculations.
- Subjects :
- Auger electron spectroscopy
Materials science
Analytical chemistry
chemistry.chemical_element
Substrate (electronics)
Chemical vapor deposition
Surfaces and Interfaces
Island growth
Condensed Matter Physics
Copper
Surfaces, Coatings and Films
chemistry
Monolayer
Materials Chemistry
Deposition (phase transition)
Work function
Subjects
Details
- ISSN :
- 01672584
- Volume :
- 134
- Database :
- OpenAIRE
- Journal :
- Surface Science Letters
- Accession number :
- edsair.doi.dedup.....0b7df425bc3a9c1fbb1310a39db34d83