Hydrogen passivation of the n-GaN nanowire/p-Si heterointerface

The influence of hydrogen plasma treatment on electrical and optical properties of the vertical GaN nanowires (NWs)/Si heterostructures synthesized via plasma assisted molecular beam epitaxy is studied. The effect of the treatment is thoroughly studied via variation of the passivation duration. Photoluminescence (PL) investigation demonstrates that the passivation affects the doping of the GaN NWs. The samples were processed as photodiodes with top transparent electrode to obtain detailed information about the n-GaN NWs/p-Si heterointerface under illumination. Electron beam induced current (EBIC) measurements demonstrated the absence of the potential barriers between active parts of the diode and the contacts, indicating ohmic behavior of the latter. I-V characteristics obtained in the dark and under illumination show that hydrogen can effectively passivate the recombination centers at the GaN NWs/Si heterointerface. The optimum passivation duration providing improved electrical properties is found to be 10 minutes within taken passivation regimes. It is demonstrated that the longer treatment causes degradation of the electrical properties. The discovered phenomenon is discussed in details.