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Deposition of Boron Containing Coatings Using MO-PACVD Process to Protect Aluminium Casting Tools
- Source :
- Journal de Physique IV Proceedings, Journal de Physique IV Proceedings, EDP Sciences, 1995, 05 (C5), pp.C5-637-C5-645. ⟨10.1051/jphyscol:1995576⟩
- Publication Year :
- 1995
- Publisher :
- EDP Sciences, 1995.
-
Abstract
- In this paper the synthesis of (B,C,N), Zr(B,C) and Zr(B,C,N) layers is investigated by means of DC pulsed plasma assisted CVD using organic compounds as precursors. The process parameters such as coating temperature, gas pressure, gas mixture, plasma parameters are varied to deposit functional coatings on hot-work steel used in the aluminium die casting industry. One of the objectives is to realize a layer type which withstands the severe service conditions in aluminium die casting. Another objective is to lower the coating temperature. The layers have been studied by light- and scanning electron microscopy (SEM). The properties of the deposited layers are determined by various analytical methods such as WDS-analysis for the chemical composition and X-ray diffraction (XRD) for the morphology. The hardness and adhesion of the layers were measured to determine the mechanical properties. The adhesion to liquid aluminium is investigated and compared to TiN layers deposited with TiCl 4 as precursor.
- Subjects :
- 010302 applied physics
Materials science
Scanning electron microscope
Plasma parameters
Metallurgy
General Physics and Astronomy
chemistry.chemical_element
02 engineering and technology
engineering.material
021001 nanoscience & nanotechnology
Microstructure
01 natural sciences
Die casting
chemistry
Coating
Chemical engineering
Aluminium
[PHYS.HIST]Physics [physics]/Physics archives
0103 physical sciences
engineering
0210 nano-technology
Tin
Layer (electronics)
Subjects
Details
- ISSN :
- 11554339 and 17647177
- Database :
- OpenAIRE
- Journal :
- Le Journal de Physique IV
- Accession number :
- edsair.doi.dedup.....08b4f527e554e08492f2d375cca44bac
- Full Text :
- https://doi.org/10.1051/jphyscol:1995576