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Weak localization and electron-electron interaction in percolating nickel films

Authors :
Marco Aprili
Jerome Lesueur
P. Nédellec
L. Dumoulin
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse (CSNSM)
Centre National de la Recherche Scientifique (CNRS)-Institut National de Physique Nucléaire et de Physique des Particules du CNRS (IN2P3)-Université Paris-Sud - Paris 11 (UP11)
Source :
Solid State Communications, Solid State Communications, Elsevier, 1997, 102, pp.41-46
Publication Year :
1997
Publisher :
Elsevier BV, 1997.

Abstract

We have investigated the scaling effects on the electron interface in inhomogeneous Ni films near the percolation threshold. As a result of the high exchange interaction of the conduction electrons, the conductance-anomaly at low temperature is due to the enhancement of the Coulomb e-e interactions by disorder. However, the magnetoresistance analysis shows that a small contribution of weak electron localization remains, while the enhancement of the e-e interactions is insensitive to the applied magnetic field. The signature of the modified dimensionality introduced by the percolating structure appears at very low temperature (T < 4 K) when the phase coherence scale is of the same order as the percolation length. In this regime, the study of the magnetoresistance renormalization proves that localization and magnetism coexist in itinerant ferromagnetic materials.

Details

ISSN :
00381098
Volume :
102
Database :
OpenAIRE
Journal :
Solid State Communications
Accession number :
edsair.doi.dedup.....085362dff5672f6442cc0ee5e7d33be1
Full Text :
https://doi.org/10.1016/s0038-1098(96)00779-x