Electrodeposition of ZnO/Cu2O Heterojunctions on Ni-Mo-P Electroless Coating

Electroless Ni-Mo-P coatings were deposited onto ceramic tiles in order to be employed as electrodes for the electrodeposition of ZnO and Cu2O heterojunction layers. Varying conditions, such as duration, annealing of the electroless coating and applied potential, and duration for ZnO electrodeposition were studied in order to optimize the properties of the ZnO/Cu2O heterojunctions toward improved photoelectrical performance. The coatings were evaluated in terms of morphology, crystalline structure, and by electrochemical and photoelectrical means. The obtained results indicated that a prolonged annealing treatment at low temperature is beneficial to improve the roughness and electrical conductivity of the Ni-Mo-P coating to further enhance the electrodeposition of ZnO. The morphology analysis revealed continuous and homogeneous Ni-Mo-P coatings. The formation of cube-like Cu2O crystals with larger grain size was induced by increasing the deposition duration of ZnO. The properties of ZnO layer are much improved when a higher cathodic potential is applied (&minus
0.8 V) for 1 h, resulting in optimum photoelectric parameters as 1.44 mA&middot
cm&minus
2 for the JSC and 760.23 &micro
V for the VOC value, respectively, for the corresponding heterojunction solar cell.