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Integration of Al2O3 as Front and Rear Surface Passivation for Large-Area Screen-Printed P-Type Si PERC
- Source :
- Energy Procedia. 27:325-329
- Publication Year :
- 2012
- Publisher :
- Elsevier BV, 2012.
-
Abstract
- Atomic layer deposition (ALD) of thin Al2O3 (
- Subjects :
- Materials science
Passivation
business.industry
engineering.material
Photovoltaics
Atomic layer deposition
Reflection (mathematics)
Coating
Stack (abstract data type)
Energy(all)
ALD
Al2O3
engineering
Electronic engineering
Optoelectronics
PERC
Quantum efficiency
Si
business
surface passivation
Common emitter
Subjects
Details
- ISSN :
- 18766102
- Volume :
- 27
- Database :
- OpenAIRE
- Journal :
- Energy Procedia
- Accession number :
- edsair.doi.dedup.....0310f26b602b93e42db6a733cb7411cc
- Full Text :
- https://doi.org/10.1016/j.egypro.2012.07.071