A method for measuring plasma parameters and dielectric film thickness by analyzing transient voltages for deposition plasma processing monitoring

Authors :: Jiwon Jung
Tae Woo Kim
Kyung-Hyun Kim
Chin-Wook Chung
Moo Young Lee
Source :: Plasma Sources Science and Technology. 29:075006
Publication Year :: 2020
Publisher :: IOP Publishing, 2020.

Subjects :: Materials science
business.industry
Plasma parameters
Dielectric
Condensed Matter Physics
law.invention
Capacitor
law
Optoelectronics
Electron temperature
Deposition (phase transition)
Plasma diagnostics
Transient (oscillation)
business
Plasma processing

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