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Stability of Mo/Si Multilayer Structure Used in Bragg-Fresnel Optics
- Source :
- Chinese Physics Letters. 15:522-524
- Publication Year :
- 1998
- Publisher :
- IOP Publishing, 1998.
-
Abstract
- The thermal and chemical stabilities of Mo/Si multilayer structure used in Bragg-Fresnel optics were studied to get optimal technological parameters of pattern generation. Mo/Si multilayers were annealed at temperature ranging from 360 to 770 K, treated with acetone and 5 parts per thousand NaOH solution, and characterized by small-angle x-ray diffraction technique as well as x-ray photoelectron spectroscopy, and Olympus microscopy.
Details
- ISSN :
- 17413540 and 0256307X
- Volume :
- 15
- Database :
- OpenAIRE
- Journal :
- Chinese Physics Letters
- Accession number :
- edsair.doi...........ff9502a1456b016b813651e6de867761