Cite

Properties of thin film silicon, prepared at high growth rate in a wide range of thicknesses

MLA

H. Stuchlíková, et al. “Properties of Thin Film Silicon, Prepared at High Growth Rate in a Wide Range of Thicknesses.” Journal of Non-Crystalline Solids, vol. 354, May 2008, pp. 2451–54. EBSCOhost, https://doi.org/10.1016/j.jnoncrysol.2007.09.079.



APA

H. Stuchlíková, Jan Kočka, Jiří Stuchlík, Martin Ledinský, Tomáš Mates, & Antonín Fejfar. (2008). Properties of thin film silicon, prepared at high growth rate in a wide range of thicknesses. Journal of Non-Crystalline Solids, 354, 2451–2454. https://doi.org/10.1016/j.jnoncrysol.2007.09.079



Chicago

H. Stuchlíková, Jan Kočka, Jiří Stuchlík, Martin Ledinský, Tomáš Mates, and Antonín Fejfar. 2008. “Properties of Thin Film Silicon, Prepared at High Growth Rate in a Wide Range of Thicknesses.” Journal of Non-Crystalline Solids 354 (May): 2451–54. doi:10.1016/j.jnoncrysol.2007.09.079.