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Spatial pattern analysis of process variations in silicon microring modulators
- Source :
- 2016 IEEE Optical Interconnects Conference (OI).
- Publication Year :
- 2016
- Publisher :
- IEEE, 2016.
-
Abstract
- We identified significant spatial patterns in the wafer-scale process variation data of silicon microring modulators. These spatial patterns implicate some variation sources in certain fabrication process steps.
- Subjects :
- Silicon photonics
Materials science
Silicon
Hybrid silicon laser
business.industry
Process (computing)
chemistry.chemical_element
02 engineering and technology
Process variation
020210 optoelectronics & photonics
chemistry
Hardware_INTEGRATEDCIRCUITS
0202 electrical engineering, electronic engineering, information engineering
Spatial ecology
Electronic engineering
Common spatial pattern
Optoelectronics
business
Subjects
Details
- Database :
- OpenAIRE
- Journal :
- 2016 IEEE Optical Interconnects Conference (OI)
- Accession number :
- edsair.doi...........faf1c48c06b1f614c7662f7f5c3456b1
- Full Text :
- https://doi.org/10.1109/oic.2016.7482978