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Common and unique aspects of perovskite thin film CVD processes

Authors :
R. Carl
Jeffrey F. Roeder
M. W. Russell
Deborah J. Desrochers
Thomas H. Baum
Steven M. Bilodeau
Bryan C. Hendrix
Frank Hintermaier
Stephen T. Johnston
Peter C. Van Buskirk
Source :
Integrated Ferroelectrics. 21:273-289
Publication Year :
1998
Publisher :
Informa UK Limited, 1998.

Abstract

In the past 5 years there has been a large amount of work to develop CVD technology for the deposition of the predominant perovskite oxide thin films, (Ba, Sr)TiO3, SrBi2Ta2O9 and Pb(Zr, Ti)O3. For each of these families of materials, CVD processes have matured such that state-of-the-art film properties may be achieved with this technique. Much of the progress is attributed to the use of the liquid delivery technique to transfer relatively involatile metalorganic precursors to the reactor. This paper will discuss common attributes of these thermal CVD processes, particularly the precursors, delivery methodology and reactor hardware. The paper will also highlight unique aspects that differentiate the processes, including the CVD decomposition regime, strategies for film composition control and approaches for forming the crystalline perovskite phase. Representative film properties are presented, demonstrating that these processes are becoming increasingly mature.

Details

ISSN :
16078489 and 10584587
Volume :
21
Database :
OpenAIRE
Journal :
Integrated Ferroelectrics
Accession number :
edsair.doi...........f905b59b9bfbe38976a64556824228e5