Back to Search Start Over

The Influence of Gas Pressure, Voltage, and Frequency on Plasma Propagation in Tube

Authors :
Dawei Liu
Yunhao Qiu
Yubin Xian
Yuanfu Yue
Xinpei Lu
Lanlan Nie
Source :
IEEE Transactions on Plasma Science. 44:2608-2614
Publication Year :
2016
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 2016.

Abstract

The influence of gas pressure and electrical parameters on low-pressure plasma has been investigated in this paper. A fast intensified charge-coupled device (ICCD) imaging is utilized to examine the dynamics of plasma bullet and plasma plume length at different pressure and plasma parameters. The experimental results reveal that the gas pressure has great influence on both the length of the plasma and on the propagation velocity of the plasma bullet. By increasing the gas pressure from 15 to 15 000 Pa, both the length of the plasma jet and the velocity of the plasma bullet first increase and then decrease. The maximum value of plasma plume occurred at 100 Pa, in which the propagation velocity gets the maximum value of $5\times 10^{6}$ m/s. Further increasing the gas pressure to 15 000 Pa results in decrease in both the plasma length and bullet velocity. Relative to voltage, the frequency of the applied pulse voltage has a different impact on the plasma propagation at different gas pressures. While a higher voltage induces a longer plasma plume and a faster propagation velocity at both 30 and 2000 Pa, increasing the frequency has little influence on plasma at 30 Pa but reduces the plasma length and propagation velocity observably at 2000 Pa. In addition, an exotic plasma plume structure is observed by ICCD. A possible hypothesis is discussed here to explain this phenomenon. These experiments may lead to a more precise control of the low-pressure plasma, warranted for advanced materials technologies.

Details

ISSN :
19399375 and 00933813
Volume :
44
Database :
OpenAIRE
Journal :
IEEE Transactions on Plasma Science
Accession number :
edsair.doi...........f82374c22bfa4d359726a4fbfffa3b33
Full Text :
https://doi.org/10.1109/tps.2016.2598551